Abstract
In this study, a new method for the production of vanadium oxide thin films has been developed. Structural analyzes of films produced in the study were performed by FTIR; whereas surface properties were examined by SEM analysis. Optical properties were measured by UV-VIS spectrophotometer and electrical characterizations were made by I/V measurements. Optical transmission curves were found to be near 60% in the vicinity of the NIR region, with a refractive index around 2.11. Films produced with urease were found to have a resistivity of less than 0.01 Ωcm. It was observed that film thicknesses varied in the range of 35–62 nm regarding the measurements made with AFM device. Surface tensions of the films were calculated using the Zismann method, which were found to vary from 19.4 to 41.5 mN/m.
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