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Abstract
A film of commercially available polyetherimide (PEI, Ultem(R)) containing diazonaphthoquinone (DNQ) and N-phenylmaleimide (PMI) was irradiated by UV light from high-pressure mercury lamp through a photomask and developed with a solution containing tetramethylammonium hydroxide (TMAH) to give negative-tone patterns with high sensitivity. PMI was found to retard dissolution of the exposed areas. PEI was dissolved into the developer as poly(amic acid) resulted from reaction of the imide groups in PEI with OH-. PMI is considered to react with OH- in the developer to give anionic intermediates, and at unexposed areas, the intermediates would regenerate OH- by reaction with water in the developer. At exposed areas, the regeneration would be inhibited by reaction with acid generated by photo-rearrangement of DNQ, and this would be the reason for the preferential dissolution at the unexposed areas.
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