A Novel Mask Compensation Pattern for Etched Microstructures with Several Convex Corners

Abstract

Convex corner cutting under the etch mask of convex corner structures anisotropically etched in (100) single-crystal silicon arises in the fabrication process of three-dimensional microstructures. This paper presents a novel design of complex corner compensation mask with small geometrical dimensions for microstructures with high packing density. These complex patterns possess defined convex corners and slits. During etching the undercut process begins at the convex corners of the etch mask and reaches after a defined time the mask openings in the compensating patterns forming new convex corners. In this way the etch front of the undercut process will be reflected for one or more times. Experimental results of an example for making V-groove-crossings show satisfactory corner compensation.