Abstract
A prototype micromachined magnetic deflector for controlling electron beam deflection in an electron beam microcolumn system (EBMS) is developed and tested. This assembled unit has major components which are electron emission emitter, source lens (extractor, accelerator, and limiting aperture), electrostatic deflector, Einzel lens, and an additional magnetic deflector. It is noticed that the deflection of the electron beam linearly increased with the applied driving current up to 70 mum. The magnetic deflector showed good performance in controlling the electron beam deflection.
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