A novel geometric error modeling optimization approach based on error sensitivity analysis for multi-axis precise motion system

Abstract

In this paper, a novel error modeling approach for multi-DOF precise motion platform (MPMP) based on the error sensitivity analysis (ESA) is introduced. Sensitivity analysis (SA) is widely adopted for finding the essential parameters in system in mathematical way. This paper leads an error sensitivity analysis based on Monte Carlo thought into geometric error model. Through comparing the variance between the set of evaluated error and corresponding orientation deviations, a sensitive order with several sensitive levels can be developed. Conventional error modeling method only concentrates the systematic accuracy, while calculation efficiency is also important. Thus, this error modeling optimization approach based on sensitivity analysis is beneficial for the high-accuracy and high-quantity manufacture environments, which is more precise and effective. It also can save the computational volume for the calculation in error model. A case study of the new error modeling optimization procedure for six-axis stage in the alignment in optoelectronic packaging system (OPS) is carried out. The time-consumed results indicate that the optimized error model can not only keep high-accuracy requirement, but also improve the computational efficiency, which is informative and effective for MPMP motion control. For large number working situation, the optimized error model is available as well.