Abstract
Several deposition techniques and the characteristics of fluorocarbon (FC) films have been investigated. First, FC film is spin-coated from cyclized perfluoro polymer (CPFP), commercialized as CYTOP. Because of its excellent durability for alkalis or acids, the FC film is used for protection of the circuit area of an integrated accelerometer from a silicon alkaline etching process by 25 wt.% TMAH at 90 °C. Secondly, FC films are formed on a field-free zone with a capacitive-coupling-type plasma-polymerization equipment using perfluorinated liquids (C 7F 16, C 8F 18, etc.) as monomer species. The deposition rates and thermal stability of the films have been investigated. The FC films are effective for elimination of in-use stiction for surface-micromachined devices.
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