A novel atomic force microscopy based lithography system for automated patterning via anodic oxidation

Abstract

An Atomic force microscopy (AFM) based lithography system is successfully designed and constructed for automated patterning through local anodic oxidation. We present the detailed design of this system, where a novel technique is introduced by utilizing a motorized high precision XY stages to provide precise pattern movements while the AFM tip remains stationery. Several in-house hardware such as source measure unit and microscope imaging camera are integrated and controlled by a software tool. Numerous oxide structures are successfully created to demonstrate the ability of this low cost and accurate system, including a 30μm long cantilever.