A novel 3D nanolens for sub-wavelength focusing by self-aligned nanolithography

Abstract

In this work, a novel type of nanolens based on super oscillation theory has been developed and fabricated. A self-aligned nanolithography process is developed to achieve error-free structured nanolens without the need of complex registration which always carries intrinsic errors. This fabrication technique significantly simplifies the process and reduces the production costs consequently. The success of this process will enable us to achieve focusing and imagining beyond diffraction limit, which will be presented in other communications.