Abstract

Polarization aberrations (PA) can be presented by Jones pupil and can also impact the imaging performance of immersion projection optics significantly. Precise PA measurement is most important for resolution enhancement technology and holistic lithography at 7nm node and below, in order to improve the pattern fidelity and processing stability. However, the current imaging-based measurement method of PA by linear approximation has not taken the coupling effect of the PA coefficients into account. This paper proposes a nonlinear measurement method of PA based on a rigorous nonlinear model to improve the measurement accuracy significantly. In this invention, the new spectrum modulation theory is developed to establish a rigorous quadratic form of PA and aerial image spectrum. A hybrid genetic algorithm is developed to solve the quadratic form inversely to obtain the PA accurately. An overall simulation validates that this method provides a superior quality of PA measurement with very high precision of 10-4λ.

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