Abstract
Ordered Si nanowire (SiNW) arrays can be fabricated by metal-assisted chemical etching. The metal mesh films (MMFs) are extremely important for achieving a high quality of the SiNWs. We have developed a two-step chemical deposition method to obtain compact porous Ag MMFs. By the separation of the nucleation and growth stages of the metal in the two-step deposition processes, the overgrowth of the metals to form randomly aggregated irregular metal particles can be overcome. Hexagonally arranged polystyrene (PS) latex microspheres have been employed as a template for the deposition of porous Ag MMFs. The spacing of the pores in the Ag MMFs is determined by the diameter of PS microspheres, and the pore size can also be tuned by changing Ar plasma etching time. One of the main advantages of the two-step deposition method lies in that Ag MMFs can be produced with PS microspheres that are not limited to a single layer, which dramatically simplifies the tedious processes of producing a monolayered PS template. The two-step chemical deposition method shows great potential in metal-assisted chemical etching.
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