Abstract

Three dimensional (3D) nano/quantum dot array structures have attracted more and more attention due to their broad applications. A new fabrication method of multilayer ordered nano dot array with low cost and high throughput is developed in this paper. This process is combination of Top-down and Bottom-up approaches: Nano Plastic Forming (NPF) patterning of metal layer coated on the substrate as Top-down approach and self-organization by dewetting as Bottom-up approach. Effects of process conditions on 3D nano-dot array formation are studied experimentally. Regularity and uniformity of first layer nano-dot array is transferred to the second layer nano-dots by optimizing thickness of the spacer layer and Au coating layer. Multilayer ordered nano dot array structures with good alignment are obtained by repeating coating and annealing processes.

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