Abstract
A new process, based on gas-flow-sputtering technique, was developed for the formation of granular films. The films in which Ni 80Fe 20 fine particles were embedded were produced by the alternate deposition of Ag vapor and Ni 80Fe 20 fine particles. The transmission electron microscopy study was carried out to examine the structure of the films. The results revealed that the new process possesses high potential for the production of a new type of granular film.
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