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Abstract
An improved silicon diaphragm pressure sensor with twin rectangular isles is presented. The twin rectangular silicon isles are formed by anisotropic etching and pattern compensation technology for convex corner undercutting. Two pairs of diffused piezoresistive gauges are located at the top surface of the edge grooves and the center groove formed by the twin isles respectively. Innercompensation of nonlinearity can be carried out by using this structure. The optimum compensation conditions have been investigated. An effective design of protection to overpressure is also presented. Its protection range is larger than 25 times the full-scale of the standard pressure range.
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