Abstract
Langmuir-Blodgett (LB) films can be assembled one monolayer at a time to produce a high quality planar sheet of accurately controlled thickness. A possible application is in the area of electron beam lithography where the best results to date have been obtained with ω-tricosenoic acid. Films of this material have acceptable sensitivity, contrast and resolution to produce very small feature sizes. However, no study has yet been reported of the time required for deposition of a film of reasonable thickness. To rectify this omission, in this paper the limitations on ω-tricosenoic acid deposition speed are investigated and a model is proposed to explain the observations. This model is based on molecular reorganization and is thought to have general applicability to LB film deposition. Transmission electron diffraction data are presented to support the theory and, for optimum dipping conditions, excellent orders is revealed even using fast dipping speeds. We therefore conclude that the time for deposition of an ω-tricosenoic acid resist film need not be significantly longer than that required for spin coating a layer of resin.
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