Abstract
This paper introduces a new process simulator for micro-electro-mechanical systems. The open-source program, which has been developed via C/C+ + language along with the OpenGL library functions, significantly speeds up the design phase by providing realistic outcomes about the micro-fabrication processes involved. While anisotropic/isotropic etching of silicon wafers are of major interest, the developed software can conveniently simulate additive micro-fabrication processes such as doping and material deposition by extending its basic cellular automaton algorithm. Equipped with an integrated mask design editor, complex mask patterns can be generated by the software. Consequently, the simulation on the subsequent micro-fabrication processes that employ these complex mask patterns can be carried out in the same integrated environment. The paper also shows that the simulation results are in agreement with the experimental ones both qualitatively and quantitatively.
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