Abstract
Aluminum oxide coatings have been synthesized on HSS, aluminum oxide and glass substrates using a magnetron sputtering system, which generates pulsed beams of high-energy gas atoms. The system comprises a flat grid positioned between the magnetron target and the substrates. Negative high-voltage pulses applied to the grid accelerate ions from the magnetron discharge plasma. Due to charge exchange collisions with gas molecules the ions turn into high-energy neutral atoms bombarding the coating growing on the substrate. They mix the substrate and coating atoms, thus enlarging the interface width, improving the coating adhesion and other properties.
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