Abstract
Aluminum oxide coatings have been synthesized on HSS, aluminum oxide and glass substrates using a magnetron sputtering system, which generates pulsed beams of high-energy gas atoms. The system comprises a flat grid positioned between the magnetron target and the substrates. Negative high-voltage pulses applied to the grid accelerate ions from the magnetron discharge plasma. Due to charge exchange collisions with gas molecules the ions turn into high-energy neutral atoms bombarding the coating growing on the substrate. They mix the substrate and coating atoms, thus enlarging the interface width, improving the coating adhesion and other properties.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have