Abstract
Although grating fabrication technologies on solid materials are well developed, grating fabrication on free standing films is rather more difficult. We propose a new film grating fabrication method based on UV-nanoimprint lithography. This method combines the grating fabrication technique using nanoimprint lithography with thin film preparation technology. It involves the fabrication of a PMMA grating by UV-nanoimprint lithography, followed by the preparation of a thin metal film on the PMMA grating and the patterning of the tensile film specimen through photolithography. After dissolving the PMMA layer, the tensile film specimen becomes a free standing structure. To identify the quality of the thin film specimen as well as the grating, the specimen is loaded with uniaxial tensile stress. The Moiré method is adopted to measure the full-field deformation and the mechanical parameters of the film specimen. The successful results verify the potential of this method in grating fabrication on other film-like specimens.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.