Abstract
Traditionally Electron Probe Micro Analysis (EPMA) has relied upon precise characterization of the continuum intensities adjacent to the emission line of interest using Wavelength Dispersive Spectrometry (WDS) for determination of the background under the peak. Recent improvements including new hardware designs with large area Bragg crystals, new software methods implementing exponential and polynomial interpolations to more accurately characterize the curvature of the background, and aggregated spectrometer signals to improve sensitivity, have enabled the EPMA to attain detection limits as low as 2 to 3 PPM in some materials.[1]
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