Abstract
An attempt was made to deposit thin film of silver onto the glass substrate by using AgCl precursor, instead of conventional precursor AgNO3 with vitamin C by inexpensive and convenient successive ionic layer adsorption and reaction (SILAR) method. The deposited silver thin film was characterized by X-ray diffraction (XRD) analysis, scanning electron microscope (SEM), UV-visible and electrical I-V study. The diffraction study showed FCC structure of metallic silver in good agreement with the standard values of JCPDS (04–0783). SEM reveals flower like nano particles produced on the substrate. The surface plasmon resonance (SPR) peak in the UV-visible spectrum shows maximum absorption at 350 nm. The film shows an ohmic behavior and its electrical resistivity was found ~103 Ω·cm at room temperature.
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