A new 7T SRAM cell in sub‐threshold region with a high performance and small area with bit interleaving capability

Abstract

In recent years, many researches have been conducted on 6T static memory performance improvements and strengthen it against soft error in sub-threshold region. These studies finally result in some SRAM cell designs with the proper performance in bit-interleaving structure and sub-threshold region in cost of more area consumption. This study presents a new bit-interleaving 7T SRAM cell which occupies less area consumption and has a better performance when compared with other 9T, 10, and 12T bit-interleaving cells. The suggested 7T cell is simulated with HSPICE in 32 nm technology and with multi-Vt transistors considering LP, HP, and standard models for HVt, LVt, and SVt transistors, respectively. The simulation results demonstrate the performance superiority of authors' proposed cell compared with its counterparts. Moreover, the simulation results (VDD = 0.5 V) show the suggested cell in comparison with conventional 6T cell improves read, hold, and write power consumptions 91.42, 91.93, and 68.7%, respectively. Also, cell stability (RSNM) and write margin (WM) parameters improve 172 and 67.2%, respectively.