Abstract
A new 3 MeV microprobe system has been constructed at the Ion Engineering Center Corporation, Osaka, in summer 1990. This system has a gas ion source (rf ion source) and an impregnated-electrode-type liquid-metal ion source, which was developed in Kyoto University, Japan. High-vapor-pressure metals (max. 0.1 Torr at melting point, e.g. Ag, Y, Cu, Au) can be used in this ion source, so various ion species (from H to Au) will be available in this system. The results of calculation of ion beam trajectories show that less then 19 μm beam spot size and 100 pA/smm 2 beam intensity can be obtained for gold ions.
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