Year-end Sale % OFF 
Abstract
The exact solution of the 2-D Poisson equation for fully depleted SOI MOSFETs is derived by using a three-zone Green's function solution technique. Based on the derived 2-D potential distribution, the front and back surface potential distributions in the Si film are analytically obtained and their accuracies are verified by 2-D numerical analysis. The calculated minimum surface potential and its location are used to analyze the drain-induced barrier-lowering effect and further to develop an analytic threshold-voltage model. Comparisons between the developed analytic threshold-voltage model and the 2-D numerical analysis are made. It is shown that excellent agreements are obtained for wide ranges of device structure parameters and applied biases. >
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
