Abstract
Abstract A negative working photoresist based on calix[4]resorcinarene, 4,4′-methylenebis[2,6-bis(hydroxymethyl)phenol] (MBHP) as a cross-linker, and a photoacid generator, diphenyliodonium 9,10-dimethoxyanthracene-2-sulfonate (DIAS), has been developed. A clear negative pattern was obtained when it was exposed to 365 nm UV light and postbaked at 130 °C, followed by developing with a 0.5% aqueous tetramethylammonium hydroxide solution at room temperature.
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