A near ambient pressure photoemission electron microscope (NAP-PEEM)

Abstract

Photoemission electron microscopy (PEEM) is a powerful surface technique for dynamic imaging of surface processes while PEEM studies have been performed under ultrahigh vacuum or high vacuum conditions. Here we report on a near ambient pressure PEEM (NAP-PEEM) instrument, which enables high resolution PEEM imaging in near ambient pressure (> 1 mbar) gases over a wide temperature range (150 – 1200 K). Installed with an electron gun near ambient pressure low energy electron microscopy (NAP-LEEM) can be achieved as well. The success of this new NAP-PEEM/LEEM instrument relies on the following key design concepts. First, a two-stage accelerating electric field consisting of a low field region between sample and intermediate electrode (“nozzle”) and a high field between nozzle and objective lens. Second, a three-stage differential pumping system allowing a near ambient pressure atmosphere at the sample surface while ultrahigh vacuum maintained in the imaging lens systems. Third, a unique NAP cell with gas inlet/outlet, light illumination, sample cooling/heating, and precise sample positioning. The new technique will have important applications in surface catalysis, thin film growth, and energy conversion devices under nearly realistic working conditions.