A multipurpose set-up using keV ions for nuclear reaction analysis, high-resolution backscattering spectrometry, low-energy PIXE and in-situ irradiation experiments

Abstract

A new chamber for material analysis and modification using energetic ions with primary particle energies in the keV regime was developed at the single stage 350 kV high-current Danfysik implanter at the Tandem Laboratory, Uppsala University. The experimental set-up allows for 11B and 18O depth profiling by Nuclear Reaction Analysis using the 11B(p,α0)8Be and 18O(p,α)15N nuclear resonances at 163 keV and at 151 keV, respectively. Additionally, a surface barrier detector with a cryogenic assembly enables High-Resolution Backscattering Spectrometry with average resolution ≈4 keV FWHM for protons. A silicon drift detector enables Low-Energy Particle Induced X-ray Emission analysis for elements with low atomic number (Z ≥ 8). The available instrumentation of the chamber assembly with its specifications are described in details with a series of applied and fundamental benchmark studies, together with some suggestions for future applications.