Abstract
Hierarchical nano/micro architectures fabricated on a Si surface via an anodic aluminum oxide etch mask can be utilized as antireflection coatings in Si-based device applications and for self-cleaning and anti-fogging surfaces.
Full Text 
Sign-in/Register to access full text options
Sign-in/Register to access full text options 
Published version (
Free)
Free) 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a call
