Abstract
Molecular-beam techniques have been used to determine the effect of oxygen adatoms on the dissociative adsorption of CH4 at a surface temperature of 400K. The initial sticking probability, s0, is always smaller than that for the clean surface in the energy range studied, 90meV≤Et≤500meV and at oxygen precoverages up to one monlayer. As the internal energy of the incident CH4 is increased, s0 for the clean and oxygen-precovered surfaces converges; oxygen blocks fewer surface sites to methane dissociative adsorption. Carbon adatoms, formed from the dissociative adsorption of CH4, react readily with Oa to form CO.
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