Abstract
A simple model for magnetron sputtering of bi-component target was developed in Ar ambient at steady state with plasma chemistry consideration. Dependence of quantities such as Ar ion current, electron density, ground and metastable excited Ar atom densities, total pressure and mean deposition rate on total discharge current have been investigated. Area ratio is independent of total discharge current and only relates to alloy composition. Ar ion current linearly increases trend with total discharge current. The values of electron (ion) density, ground and metastable excited state Ar atom densities are of the orders of 109, 1014 and 1010 cm−3, respectively. Mean deposition rate is calculated with scattering (collisions) consideration.
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