Abstract

Oxide dispersion strengthened (ODS) high-entropy alloys (HEAs) exhibit a great resistance to creep, which has a great application potential on the nuclear energy field. However, the classical creep model hardly considers the coupling effect of the cutting and Orowan bypassing mechanism as well as severe atomic lattice distortion in ODS HEAs, leading to low prediction accuracy. Here, we propose a dislocation theory-based constitutive model for strength and creep rate considering the climbing mechanism, shearing mechanism, and Orowan bypassing mechanism in ODS HEAs. In addition, the effects of the size and spatial distribution of the oxide particle on creep rate and strength are studied. The creep rate and yield strength obtained from the experiments and developed model are compared to verify the rationality and accuracy. The proposed model has demonstrated a high prediction accuracy, with the creep rate and yield strength achieving levels as high as 98.2 % and 98.1 %, respectively. The incorporation of oxide particles within a specific size range and volume fraction has been proven to significantly improve creep resistance. Interestingly, the fracture time has the potential to exceed 41 years, significantly surpassing that Zr-based alloys under the same conditions. This model would be utilized to predict the creep rate in response to a complex applied stress, offering theoretical guidance for the development of ODS HEAs with superior creep resistance for nuclear reactor cladding materials.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.