Abstract
A microridge-like structure was prepared on the surface of a c-Si substrate with Au hard-masks by reactive ion etching and their application to photovoltaic devices. Compared to the planar and nanoporous-like structures, the microridge-like Si substrate had the lowest reflectance especially in the ultraviolet and visible light range . It was also found that short-circuit photocurrent density, open circuit voltage, fill factor, and conversion efficiency of microridge-like Si solar cells were , , 63.4%, and 9.17%, respectively. Furthermore, compared with the planar and nanoporous-like Si solar cells, it can be clearly seen that the photovoltaic conversion efficiency was improved around 28 and 20%, respectively.
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