Abstract
A novel microcomputer-based electron beam (EB) deposition technique has been developed for preparing thin films with graded composition. A conventional EB gun crucible has been modified to accommodate two constituent materials. Necessary electronic hardware and a software-based INTEL 8085 microcomputer have been built to provide the crucible rotation with the required speed and for changing the emission currents for the EB gun. Mixed oxide films of CeO/sub 2/ and SiO/sub 2/ with composition varying along their thicknesses have been prepared. The composition gradation has been altered by varying the deposition rate and rotational speed of individual constituents. The atomic percentages of Ce, Si, and O have been computed from deposition parameters and correlated with the data obtained from Auger spectroscopy.
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