Abstract

A unique technique of maskless and self-aligned Si etch between bonded wafers was developed and applied to fabricate a micro-channel heat sink integrated with a heater and an array of temperature sensors. The technique allowed the formation of self-aligned and self-stopped etching of grooves between the bonded wafers. The device, consisting of distributed sensors, allowed direct temperature measurements to evaluate local heat transfer rates under forced convection boiling conditions. Temperature distributions along the heat sink were measured for different levels of power dissipation. The onset of critical heat flux condition was investigated as a function of channel size and liquid flow rate. The results suggest that the bubble dynamic mechanism in micro-channels maybe different from that with conventional channels.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.