Abstract
A method is proposed for the determination of the complex refractive index of non-metallic thin films using photometric measurements at normal incidence over an extended wavelength interval. A necessary condition for the applicability of the method is the existence of maxima and minima in the reflectance due to interference effects. The problem of multiple solutions is analysed and the optical thicknesses at the extrema are used for choosing the correct solutions. For absorbing films two alternative procedures are described. One procedure requires an approximate value of the film thickness to start with and refines it during the calculation. The other procedure does not depend on a previous knowledge of the thickness but gives it as a result together with n(λ) and k(λ). A separate procedure is proposed for transparent and almost transparent films. An application of the method is carried out in which excellent agreement is obtained between calculated and experimental results.
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