A Metal-Via Resistance Based Physically Unclonable Function With Backend Incremental ADC

Abstract

This paper presents a novel physically unclonable function (PUF) for security authentication. Instead of using the variation of transistors or PDK provided passive components as entropy source, the parasitic resistance created between metal and via layers is used as the static entropy source. A symmetric bridge configuration consisted with the parasitic resistance creates the necessary voltage difference for comparison. An accurate backend incremental analog-to-digital converter (IADC) is implemented to convert the voltage difference into a digitized value. The operation of the IADC allows to achieve a good native instability. Two different types of layout structures are implemented to create the necessary parasitic resistance and compared. Fabricated in a 65nm process, the prototype PUF achieves a native instability and bit error rate of less than 1.45% and 0.12% with 5000 repeated evaluations. The proposed design shows 0.58%/0.1V and 0.53%/10°C bit error across the voltage and temperature range of 0.9 to 1.4V and 0°C to 85°C, respectively without any stabilization techniques. The distance ratio between intra-die and inter-die Hamming Distance is above $305\times $ .