Abstract
In this work, the reactive ion etching of Mo by SF6 and O2 has been investigated by studying the etching mec hanism. The etching species, etch products, and Mo surface analysis by x− ray photoemission spectroscopy (XPS or ESCA) and electron energy−loss spectroscopy (EELS) have been analyzed to b etter understand the etching mechanism. (AIP)
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Schedule a callMore From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
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