Abstract
The thermal dissociation of phosphine and of a phosphine—disilane gas mixture as a function of temperature has been studied in an impinging jet type LPCVD reactor. In order to measure the influence of homogeneous gas phase reactions, two configurations (cold and hot wall) were used. A quadrupole mass spectrometer (QMS) coupled with the reactor using a sampling system near the substrate surface was used to follow the gas phase composition. PH 3 begins to decompose at 550°C. Formation of the phosphorus dimer (P 2) and tetramer (P 4) is demonstrated; P 4 is the main product. When Si 2H 6 is added to this gaseous mixture, formation of monosilylphosphine SiPH 5 is observed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
