Abstract
A low-cost fabrication method for high aspect ratio nano-channels is proposed in this paper. The near-field exposure principle based on Fresnel diffraction was analyzed and the silicon nano-mold with the height of 962 ± 9 nm and width of 332 ± 12 nm was produced. Furthermore, the applicable demolding conditions for high aspect ratio nanoimprinting were studied, and the SU-8 nano-channels with the height of 947 ± 17 nm and width of 336 ± 13 nm were fabricated.
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