Abstract
Recently, a Transverse Excited Atmospheric (TEA) CO2 laser technology has been developed for the micro‐machining of vias in non‐reinforced glass laminates. This system has been designed to accommodate the large panel sizes associated with PWB processing. The salient features of this modified CO2 laser technology are summarised. A joint Lumonics/Motorola study was carried out to assess the applicability of this laser processing technology for use in higher density PWB and MCM‐L substrate processing and its compatibility with currently available classes of dielectrics used in high density interconnect applications. A 10x improvement in cycle time/throughput over the existing raster scanning laser ablation process has been demonstrated.
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