Abstract

We present a computed tomography (CT) setup for materials characterization with significantly improved resolution as compared to state of the art mirco- or subμ-CT systems. The system presented here is composed of a customized JEOL JSM7100-F scanning electron microscope with a thermal field-emission electron source allowing to focus an intense electron beam onto specially designed micro-structured reflection target thereby further reducing the size of the X-ray source spot by reducing the electron interaction zone and thus reducing image blur at high magnifications.With the proposed setup geometric magnifications up to M=1000 and spatial resolutions down to 100nm can be achieved. We also demonstrate the phase contrast capabilities of the setup.

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