Abstract
The sputtering–atomising properties of a conventional flat bottom hollow cathode discharge (FBHCD) are analyzed. Furthermore, a modification of the HCD grounded on a conical bottom (CB) cylindrical cathode is reported. This CBHCD enhances the main HCD property, i.e. the sputtering of the surface of cathode or inserted probe. Comparative polarization measurements with a FBHCD show a stronger narrowing of the Hanle signal width for the sputtered Cu atoms with the CBHCD. Thus, their density is higher in CBHCD. This result is confirmed by the opto-galvanic radial profile. It contains two peaks of the mentioned density, i.e. near the cylindrical cathode surface and over the cone peak. Some preliminary examinations of CBHCD as an ion source in three arrangements are performed and discussed.
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