Abstract
In this study, we propose and fabricate a perfect absorber on a planar substrate using alternate silicon dioxide and ultrathin metallic lossy chromium (Cr) films. Furthermore, we transfer the absorber to a curved substrate via an optimization design of symmetric structures. The absorber exhibits a highly efficient absorption and large incident-angular tolerance characteristics in the whole visible region. We investigate each layer contribution to the absorption theoretically, and find that ultrathin (~5 nm) lossy Cr films play a dominant absorptive role. Using the effective interface method, we calculate the phase difference on the lossy Cr front surface. It is close to the destructive interference condition, from which we clarify why the proposed structures can produce a highly efficient absorption.
Highlights
Efficient light absorbers are greatly attractive in wide science and technology applications, such as stray light reduction, blackbody cavity, optical, and optoelectronic devices [1,2,3,4]
We propose we transfer the absorber to a curved substrate via an optimization design of symmetric structures
We transfer the absorber to a curved substrate via an optimization design of Detailed absorptive mechanisms are discussed
Summary
Efficient light absorbers are greatly attractive in wide science and technology applications, such as stray light reduction, blackbody cavity, optical, and optoelectronic devices [1,2,3,4]. Improving the stray light suppression is greatly important for optical instruments, especially space-flight optical instruments. Earth and space astrophysical observations are tremendously impacted by stray light, which obscures very dim objects and degrades signal to noise in optical measurements. Many studies have demonstrated that plasmonic microstructures and metamaterials can achieve a perfect or near-perfect absorption [14,15,16]. Owing to their resonant nature, plasmonic absorbers are generally limited to a narrow spectral range. For plasmonic microstructures and metamaterials, they often require time-consuming, complex, and expensive nano-scale fabrication processes
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