Abstract
We use the Green's tensor technique to study the optical processes taking place in configurations typically used for the replication and characterization of nanostructures. For the replication process we investigate light‐coupling masks for optical contact lithography and for the characterization process the mode scattered by a defect or a short grating in a planar waveguide. Both configurations consist of structures embedded in a stratified background composed of a stack of material layers with different permittivities. We perform calculations for two‐dimensional and three‐dimensional structures and compare their optical behavior. Our results show that the additional material interfaces in three‐dimensional systems can lead to significantly different field distributions and must be taken into account for a complete understanding of the electromagnetic properties of the systems.
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