Abstract
Reactive sputtering of different metallic targets (Ti, Fe, Co, Ni, Cu, Zn, Mo, Pd, Ag, Sn, Ta, Pt and Au) was studied by glow discharge mass spectrometry. The amounts of atomic and molecular species were measured as functions of the oxygen total pressure. The relative oxide molecular contribution decreases with increasing pressure. A correlation was found between the ratio I MO + / I M + of the molecular current to the atomic current and the formation enthalpy of MO(g). The mechanism of reactive sputtering could be interpreted in most cases by: (1) a dissociative ejection of metals and oxygen from the cathode; (2) molecular formation close to the surface; (3) molecular dissociation during the transfer from the surface to the substrate.
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