Abstract

In this short commentary, we discuss a fundamental reason why two different semiconductor technologies are needed for complementary thin-film transistor (TFT) operations. It is mainly related to an energy-level matching between the band edge of the semiconductor and the work-function energy of the metal, which is used for the source and drain electrodes. The reference energy level is determined by the energy range of work-functions of typical metals for the source and drain electrodes. With the exception of silicon, both the conduction band edge (EC) and valence band edge (EV) of a single organic or inorganic material are unlikely to match the metal work-function energy whose range is typically from –4 to –6 eV. For example, typical inorganic materials, e.g., Zn–O, have the EC of around –4.5 eV (i.e., electron affinity), so the conduction band edge is within the range of the metal work-function energy, suggesting its suitability for n-channel TFTs. On the other hand, p-type inorganic materials, such as Cu–O, have an EV of around –5.5 eV, so the valence band edge is aligned with metal work-function energy, thus the usage for p-channel TFTs. In the case of p-type and n-type organic materials, their highest occupied molecular orbital (HOMO) and lowest occupied molecular orbital (LUMO) should be aligned with metal work-function energy. For example, p-type organic material, e.g., pentacene, has a HOMO level around –5 eV, which is within the range of the metal work-function energy, implying usage for p-channel TFTs. However, its LUMO level is around –3 eV, not being aligned with the metals’ work-function energy. So it is hard to use pentacene for n-channel TFTs. Along with this, n-type organic materials (e.g., C60) should have HOMO levels within the typical metals’ work-function energy for the usage of n-channel TFT. To support this, we provide a qualitative and comparative study on electronic material properties, such as the electron affinity and band-gap of representative organic and inorganic materials, and the work-function energy of typical metals.

Highlights

  • Complementary metal-oxide-semiconductor (CMOS) technology is a mature and traditional device technology, especially for non-display applications [1]

  • We show a qualitative and comparative study on electronic material properties of some organic and inorganic materials and the work-function energy of some of the metals typically used in thin-film transistor (TFT)

  • Since the work-function energy of typical metals is within the range from −4 to −6 eV, only the conduction band edge of n-type inorganic materials is aligned with the metal which is used for an electrode in

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Summary

Introduction

Complementary metal-oxide-semiconductor (CMOS) technology is a mature and traditional device technology, especially for non-display applications [1]. We present a theoretical discussion on a fundamental reason why two different semiconductor technologies should be employed for complementary TFT operations It is mainly associated with an energy-level alignment between the band edge of the semiconductor and work-function energy of the metal incorporated as the source or drain electrode where the main transport carrier (e.g., electrons or holes) is supplied or collected. This suggests that both the conduction band minimum and valence band maximum of a single organic or inorganic material are unlikely to fit the work-function energy of typical metals.

Comparative Table of Electronic Material Properties
Metals
Electron Transport and n-Type Inorganic Materials with Metals
Hole Transport and p-Type Inorganic Materials with Metals
Hole Transport and p-Type Organic Materials with Metals
Electron Transport and n-Type Organic Materials with Metals
Summary
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