Abstract
A simple formula has been developed that allows the calculation of the background contributed by the substrate in TXRF both exactly and in absolute terms. The scattered X-radiation from any surface is described as a function of the incidence angle and of the X-ray cross sections for scattering and total absorption of the substrate material. The formula has been confirmed experimentally for silicon, acryl and gold. Measured and calculated values agree within reasonable limits. The deviations between predicted and measured data decrease with increasing angle of incidence from up to 20% in the low angle regime down to a few percent beyond the critical angle of total reflection as a result of the decreasing influence of surface roughness.
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