Abstract

An ultra-thin (15 nm) InGaAs nanomembrane field-effect phototransistor is transferred entirely from a rigid InP substrate onto a flexible SU-8 on a polydimethylsiloxane substrate. The transferred InGaAs device exhibits wide-band spectral response tunability up to 1.8 µm, from the visible to near-infrared light. Using an epitaxial lift-off process of InGaAs-on-InP MOSHEMT, the transferred device is inverted with a fully exposed channel for photosensitivity enhancement, while retaining three terminals for photocurrent amplification and modulation. The photocurrent can be tuned ∼5 orders over a gate bias range of 6 V. On-state photo-responsivities of 350 A/W to 15 A/W for 0.6 µm and 1.8 µm of light, respectively, is measured, ∼2 × higher than existing silicon and III-V photodetectors. Furthermore, the device shows no electrical performance degradation when flexed down to 10-cm radius, demonstrating suitability for conformal surface sensor applications.

Highlights

  • We show a novel flexible photoFET architecture based on an inverted thin-body (15 nm) InGaAs (In = 52%) nanomembrane with a theoretical direct bandgap of ∼0.7 eV.28

  • Blockage of incident light by the contact metal is completely avoided as compared to the same device with top metallization

  • Through biasing of the three terminals, the photoFET photocurrent can be tuned by ∼5 orders over incident light wavelengths of 0.6 μm–1.8 μm

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Summary

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Photocurrent Incident Power
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