Abstract
A stress exists in solid surfaces even if the underlying bulk material is stress-free. This paper investigates the effect of surface stress on the value of the Si lattice parameter measured by combined x-ray and optical interferometry. An elastic-film model has been used to provide a surface load in a finite element model on the x-ray interferometer crystal. Eventually, an interferometer design is proposed to determine a measurement where the effect of the surface stress is deemed to be detected.
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