Abstract

Thin films of Mo on W, Ir and Re were grown from vapor phase in a demountable field ion microscope whose attainable vacuum was about 1×10-7 Torr or better. It was found that when specimens were treated thermally at adequate temperatures during and after deposition thin films were grown epitaxially with its own structure for all three systems. However, the interface between the films and their underlying substrates, one or possibly two atomic layers of Mo, repeated substrate structures with a certain amount of atomic disorder. Orientation relationships could be directly determined from field ion micrographs.

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