Abstract
We report the design of a two-degree-of-freedom microelectromechanical systems nanopositioner for on-chip atomic force microscopy (AFM). The device is fabricated using a silicon-on-insulator-based process to function as the scanning stage of a miniaturized AFM. It is a highly resonant system with its lateral resonance frequency at ${\sim}{\rm 850}~{\rm Hz}$ . The incorporated electrostatic actuators achieve a travel range of 16 $\mu{\rm m}$ in each direction. Lateral displacements of the scan table are measured using a pair of electrothermal position sensors. These sensors are used, together with a positive position feedback controller, in a feedback loop, to damp the highly resonant dynamics of the stage. The feedback controlled nanopositioner is used, successfully, to generate high-quality AFM images at scan rates as fast as 100 Hz. $\hfill[2013\hbox{--}0063]$
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