A dual-stage correction approach for high-precision phase-shifter in Fizeau interferometers

Abstract

This paper proposes a dual-stage correction approach for a high-accuracy phase-shifter in Fizeau laser interferometers, effectively reducing the phase shift errors in PSI (Phase-Shifting interferometry) and improving the precision of surface profile measurements. The precision of PSI depends on the displacement accuracy of the reference mirror, and the function of the phase shifter is to drive the reference mirror to generate wavelength-level displacements with nanometer-level accuracy. The first-stage correction aims to reduce the nonlinearity error of the reference mirror by ULPS (Ultra-High Linearity Phase Shifter). The second-stage correction aims to reduce the average velocity error and plane velocity uniformity error of the reference mirror by AVIC (Auto Velocity Iterative Correction). The experimental results indicate that, after the first-stage correction, ULPS exhibits a 0.05 % nonlinearity, a 2.5 nm repeatability, and a 0.2 nm resolution under a load of 20 kg, and its nonlinearity surpassing all phase-shifters documented in the literature. After the second-stage correction, the average velocity error and plane velocity uniformity error of the reference mirror are reduced to 0.07 %.